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Significant improvements in InGaN/GaN nano-photoelectrodes for hydrogen generation by structure and polarization optimization.


ABSTRACT: The photoelectrodes based on III-nitride semiconductors with high energy conversion efficiency especially for those self-driven ones are greatly desirable for hydrogen generation. In this study, highly ordered InGaN/GaN multiple-quantum-well nanorod-based photoelectrodes have been fabricated by a soft UV-curing nano-imprint lithography and a top-down etching technique, which improve the incident photon conversion efficiency (IPCE) from 16% (planar structure) to 42% (@ wavelength?=?400?nm). More significantly, the turn-on voltage is reduced low to -0.6?V, which indicates the possibility of achieving self-driven. Furthermore, SiO2/Si3N4 dielectric distributed Bragg reflectors are employed to further improve the IPCE up to 60%. And the photocurrent (@ 1.1?V) is enhanced from 0.37?mA/cm(2) (original planar structure) to 1.5?mA/cm(2). These improvements may accelerate the possible applications for hydrogen generation with high energy-efficiency.

SUBMITTER: Tao T 

PROVIDER: S-EPMC4745013 | biostudies-literature | 2016 Feb

REPOSITORIES: biostudies-literature

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Significant improvements in InGaN/GaN nano-photoelectrodes for hydrogen generation by structure and polarization optimization.

Tao Tao T   Zhi Ting T   Liu Bin B   Li Mingxue M   Zhuang Zhe Z   Dai Jiangping J   Li Yi Y   Jiang Fulong F   Luo Wenjun W   Xie Zili Z   Chen Dunjun D   Chen Peng P   Li Zhaosheng Z   Zou Zhigang Z   Zhang Rong R   Zheng Youdou Y  

Scientific reports 20160208


The photoelectrodes based on III-nitride semiconductors with high energy conversion efficiency especially for those self-driven ones are greatly desirable for hydrogen generation. In this study, highly ordered InGaN/GaN multiple-quantum-well nanorod-based photoelectrodes have been fabricated by a soft UV-curing nano-imprint lithography and a top-down etching technique, which improve the incident photon conversion efficiency (IPCE) from 16% (planar structure) to 42% (@ wavelength = 400 nm). More  ...[more]

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