Browse
Submit Data
Databases
API
Help

Dataset Information

19 Views

0 Connections

0 Citations

0 Reanalyses

0 Downloads

Omics score: 0

Novel Self-shrinking Mask for Sub-3?nm Pattern Fabrication.

ABSTRACT: It is very difficult to realize sub-3?nm patterns using conventional lithography for next-generation high-performance nanosensing, photonic, and computing devices. Here we propose a completely original and novel concept, termed self-shrinking dielectric mask (SDM), to fabricate sub-3?nm patterns. Instead of focusing the electron and ion beams or light to an extreme scale, the SDM method relies on a hard dielectric mask which shrinks the critical dimension of nanopatterns during the ion irradiation. Based on the SDM method, a linewidth as low as 2.1?nm was achieved along with a high aspect ratio in the sub-10?nm scale. In addition, numerous patterns with assorted shapes can be fabricated simultaneously using the SDM technique, exhibiting a much higher throughput than conventional ion beam lithography. Therefore, the SDM method can be widely applied in the fields which need extreme nanoscale fabrication.

SUBMITTER: Yang PS

PROVIDER: S-EPMC4940743 | biostudies-literature | 2016 Jul

REPOSITORIES: biostudies-literature

ACCESS DATA

Json Xml

Publications

Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication.

Yang Po-Shuan PS Cheng Po-Hsien PH Kao C Robert CR Chen Miin-Jang MJ

Scientific reports 20160712

It is very difficult to realize sub-3 nm patterns using conventional lithography for next-generation high-performance nanosensing, photonic, and computing devices. Here we propose a completely original and novel concept, termed self-shrinking dielectric mask (SDM), to fabricate sub-3 nm patterns. Instead of focusing the electron and ion beams or light to an extreme scale, the SDM method relies on a hard dielectric mask which shrinks the critical dimension of nanopatterns during the ion irradiati ...[more]

PMID: 27404325

Similar Datasets

Robust pattern transfer of nanoimprinted features for sub-5-nm fabrication.

Project description:We explore the limits of a simple and facile process for transferring low aspect ratio, high-resolution features defined by nanoimprint lithography. The process involves postimprint deposition of an angle-evaporated hard mask. This widens the process window for residual resist removal and facilitates easy liftoff. An added benefit is a concomitant reduction of feature size. A postliftoff annealing step produces high pattern uniformity and additional feature size reduction. The process is extremely robust, and it enables relatively straightforward fabrication of sub-5-nm spherical structures. It is extendible to rectilinear patterns as well.

| S-EPMC2761997 | biostudies-literature

Poly(styrene)-<i>block</i>-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication.

Project description:Sequential infiltration synthesis (SIS) into poly(styrene)-block-maltoheptaose (PS-b-MH) block copolymer using vapors of trimethyl aluminum and water was used to prepare nanostructured surface layers. Prior to the infiltration, the PS-b-MH had been self-assembled into 12 nm pattern periodicity. Scanning electron microscopy indicated that horizontal alumina-like cylinders of 4.9 nm diameter were formed after eight infiltration cycles, while vertical cylinders were 1.3 nm larger. Using homopolymer hydroxyl-terminated poly(styrene) (PS-OH) and MH films, specular neutron reflectometry revealed a preferential reaction of precursors in the MH compared to PS-OH. The infiltration depth into the maltoheptaose homopolymer film was found to be 2.0 nm after the first couple of cycles. It reached 2.5 nm after eight infiltration cycles, and the alumina incorporation within this infiltrated layer corresponded to 23 vol % Al2O3. The alumina-like material, resulting from PS-b-MH infiltration, was used as an etch mask to transfer the sub-10 nm pattern into the underlying silicon substrate, to an aspect ratio of approximately 2:1. These results demonstrate the potential of exploiting SIS into carbohydrate-based polymers for nanofabrication and high pattern density applications, such as transistor devices.

| S-EPMC8290925 | biostudies-literature

Sub-10 nm nanogap fabrication on suspended glassy carbon nanofibers.

Project description:Glassy carbon nanofibers (GCNFs) are considered promising candidates for the fabrication of nanosensors for biosensing applications. Importantly, in part due to their great stability, carbon electrodes with sub-10 nm nanogaps represent an attractive platform for probing the electrical characteristics of molecules. The fabrication of sub-10 nm nanogap electrodes in these GCNFs, which is achieved by electrically stimulating the fibers until they break, was previously found to require fibers shorter than 2 µm; however, this process is generally hampered by the limitations inherent to photolithographic methods. In this work, to obtain nanogaps on the order of 10 nm without the need for sub-2 µm GCNFs, we employed a fabrication strategy in which the fibers were gradually thinned down by continuously monitoring the changes in the electrical resistance of the fiber and adjusting the applied voltage accordingly. To further reduce the nanogap size, we studied the mechanism behind the thinning and eventual breakdown of the suspended GCNFs by controlling the environmental conditions and pressure during the experiment. Following this approach, which includes performing the experiments in a high-vacuum chamber after a series of carbon dioxide (CO2) purging cycles, nanogaps on the order of 10 nm were produced in suspended GCNFs 52 µm in length, much longer than the ~2 µm GCNFs needed to produce such small gaps without the procedure employed in this work. Furthermore, the electrodes showed no apparent change in their shape or nanogap width after being stored at room temperature for approximately 6 months.

| S-EPMC8433410 | biostudies-literature

Rapid fabrication of self-ordered porous alumina with 10-/sub-10-nm-scale nanostructures by selenic acid anodizing.

Project description:Anodic porous alumina has been widely investigated and used as a nanostructure template in various nanoapplications. The porous structure consists of numerous hexagonal cells perpendicular to the aluminum substrate and each cell has several tens or hundreds of nanoscale pores at its center. Because the nanomorphology of anodic porous alumina is limited by the electrolyte during anodizing, the discovery of additional electrolytes would expand the applicability of porous alumina. In this study, we report a new self-ordered nanoporous alumina formed by selenic acid (H2SeO4) anodizing. By optimizing the anodizing conditions, anodic alumina possessing 10-nm-scale pores was rapidly assembled (within 1 h) during selenic acid anodizing without any special electrochemical equipment. Novel sub-10-nm-scale spacing can also be achieved by selenic acid anodizing and metal sputter deposition. Our new nanoporous alumina can be used as a nanotemplate for various nanostructures in 10-/sub-10-nm-scale manufacturing.

| S-EPMC3782885 | biostudies-other

Scalable fabrication of sub-10 nm polymer nanopores for DNA analysis.

Project description:We present the first fabrication of sub-10 nm nanopores in freestanding polymer membranes via a simple, cost-effective, high-throughput but deterministic fabrication method. Nanopores in the range of 10 nm were initially produced via a single-step nanoimprinting process, which was further reduced to sub-10 nm pores via a post-NIL polymer reflow process. The low shrinkage rate of 2.7 nm/min obtained under the conditions used for the reflow process was the key to achieving sub-10 nm pores with a controllable pore size. The fabricated SU-8 nanopore membranes were successfully employed for transient current measurements during the translocation of DNA molecules through the nanopores.

| S-EPMC6453903 | biostudies-literature

Resistive Switching of Sub-10 nm TiO? Nanoparticle Self-Assembled Monolayers.

Project description:Resistively switching devices are promising candidates for the next generation of non-volatile data memories. Such devices are up to now fabricated mainly by means of top-down approaches that apply thin films sandwiched between electrodes. Recent works have demonstrated that resistive switching (RS) is also feasible on chemically synthesized nanoparticles (NPs) in the 50 nm range. Following this concept, we developed this approach further to the sub-10 nm range. In this work, we report RS of sub-10 nm TiO? NPs that were self-assembled into monolayers and transferred onto metallic substrates. We electrically characterized these monolayers in regard to their RS properties by means of a nanorobotics system in a scanning electron microscope, and found features typical of bipolar resistive switching.

| S-EPMC5707587 | biostudies-literature

Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices.

Project description:Break junctions provide tip-shaped contact electrodes that are fundamental components of nano and molecular electronics. However, the fabrication of break junctions remains notoriously time-consuming and difficult to parallelize. Here we demonstrate true parallel fabrication of gold break junctions featuring sub-3 nm gaps on the wafer-scale, by relying on a novel self-breaking mechanism based on controlled crack formation in notched bridge structures. We achieve fabrication densities as high as 7 million junctions per cm2, with fabrication yields of around 7% for obtaining crack-defined break junctions with sub-3 nm gaps of fixed gap width that exhibit electron tunneling. We also form molecular junctions using dithiol-terminated oligo(phenylene ethynylene) (OPE3) to demonstrate the feasibility of our approach for electrical probing of molecules down to liquid helium temperatures. Our technology opens a whole new range of experimental opportunities for nano and molecular electronics applications, by enabling very large-scale fabrication of solid-state break junctions.

| S-EPMC6109151 | biostudies-literature

Sub-100-nm metafluorophores with digitally tunable optical properties self-assembled from DNA.

Project description:Fluorescence microscopy allows specific target detection down to the level of single molecules and has become an enabling tool in biological research. To transduce the biological information to an imageable signal, we have developed a variety of fluorescent probes, such as organic dyes or fluorescent proteins with different colors. Despite their success, a limitation on constructing small fluorescent probes is the lack of a general framework to achieve precise and programmable control of critical optical properties, such as color and brightness. To address this challenge, we introduce metafluorophores, which are constructed as DNA nanostructure-based fluorescent probes with digitally tunable optical properties. Each metafluorophore is composed of multiple organic fluorophores, organized in a spatially controlled fashion in a compact sub-100-nm architecture using a DNA nanostructure scaffold. Using DNA origami with a size of 90 × 60 nm2, substantially smaller than the optical diffraction limit, we constructed small fluorescent probes with digitally tunable brightness, color, and photostability and demonstrated a palette of 124 virtual colors. Using these probes as fluorescent barcodes, we implemented an assay for multiplexed quantification of nucleic acids. Additionally, we demonstrated the triggered in situ self-assembly of fluorescent DNA nanostructures with prescribed brightness upon initial hybridization to a nucleic acid target.

| S-EPMC5479647 | biostudies-literature

MASK

Project description:16S sequencing data from skin microbiota samples derived from female volunteers

| PRJEB45035 | ENA

Large-scale fabrication of highly ordered sub-20?nm noble metal nanoparticles on silica substrates without metallic adhesion layers.

Project description:Periodic noble metal nanoparticles offer a wide spectrum of applications including chemical and biological sensors, optical devices, and model catalysts due to their extraordinary properties. For sensing purposes and catalytic studies, substrates made of glass or fused-silica are normally required as supports, without the use of metallic adhesion layers. However, precise patterning of such uniform arrays of silica-supported noble metal nanoparticles, especially at sub-100?nm in diameter, is challenging without adhesion layers. In this paper, we report a robust method to large-scale fabricate highly ordered sub-20?nm noble metal nanoparticles, i.e., gold and platinum, supported on silica substrates without adhesion layers, combining displacement Talbot lithography (DTL) with dry-etching techniques. Periodic photoresist nanocolumns at diameters of ~110?nm are patterned on metal-coated oxidized silicon wafers using DTL, and subsequently transferred at a 1:1 ratio into anti-reflection layer coating (BARC) nanocolumns with the formation of nano-sharp tips, using nitrogen plasma etching. These BARC nanocolumns are then used as a mask for etching the deposited metal layer using inclined argon ion-beam etching. We find that increasing the etching time results in cone-shaped silica features with metal nanoparticles on the tips at diameters ranging from 100?nm to sub-30?nm, over large areas of 3×3?cm2. Moreover, subsequent annealing these sub-30?nm metal nanoparticle arrays at high-temperature results in sub-20?nm metal nanoparticle arrays with ~1010 uniform particles.

| S-EPMC6161447 | biostudies-literature

OmicsDI is part of the ELIXIR infrastructure

OmicsDI is an Elixir interoperability service. Learn more ›

OmicsDI Databases

PRIDE
PeptideAtlas
MassIVE
JPOST Repository
Physiome Model Repository

EGA
EVA
ENA
LINCS
PAXDB
Cell Collective

MetaboLights
Metabolomics Workbench
MetabolomeExpress
GNPS
BioModels
FAIRDOMHub

ArrayExpress
dbGaP
ExpressionAtlas
GEO
NODE

Information

Databases
Help
API
Contact us
Code on GitHub
Terms of use
Submit Data