Ontology highlight
ABSTRACT:
SUBMITTER: Huang CP
PROVIDER: S-EPMC5541044 | biostudies-literature | 2017 Aug
REPOSITORIES: biostudies-literature
Huang Chun-Pin CP Gupta Kapil K Wang Chao-Hung CH Liu Chuan-Pu CP Lai Kun-Yu KY
Scientific reports 20170802 1
1.5-μm AlN grown by metal-organic chemical vapor deposition (MOCVD), with a single substrate temperature of 1180 °C, exhibits atomically flat surface and the XRD (102) peak width of 427 arcsec. The results are achieved with a pulsed NH<sub>3</sub>-flow condition, serving as an alternative for the commonly used temperature-varied buffer structure, which is often complicated and time-consuming. Inserting two pulsed-NH<sub>3</sub>-flow AlN layers in the epitaxial structure not only releases the lat ...[more]