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A low-noise silicon nitride nanopore device on a polymer substrate.

ABSTRACT: We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

SUBMITTER: Choi W

PROVIDER: S-EPMC6054398 | biostudies-literature | 2018

REPOSITORIES: biostudies-literature

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A low-noise silicon nitride nanopore device on a polymer substrate.

Choi Wook W Jeon Eun-Seok ES Chun Kyoung-Yong KY Kim Young-Rok YR Park Kyeong-Beom KB Kim Ki-Bum KB Han Chang-Soo CS

PloS one 20180720 7

We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to th ...[more]

PMID: 30028848

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