Dataset Information

La₅ Ti₂ Cu_0.9 Ag_0.1 S₅ O₇ Modified with a Molecular Ni Catalyst for Photoelectrochemical H₂ Generation.

ABSTRACT: The stable and efficient integration of molecular catalysts into p-type semiconductor materials is a contemporary challenge in photoelectrochemical fuel synthesis. Here, we report the combination of a phosphonated molecular Ni catalyst with a TiO₂ -coated La₅ Ti₂ Cu_0.9 Ag_0.1 S₅ O₇ photocathode for visible light driven H₂ production. This hybrid assembly provides a positive onset potential, large photocurrents, and high Faradaic yield for more than three hours. A decisive feature of the hybrid electrode is the TiO₂ interlayer, which stabilizes the oxysulfide semiconductor and allows for robust attachment of the phosphonated molecular catalyst. This demonstration of an oxysulfide-molecular catalyst photocathode provides a novel platform for integrating molecular catalysts into photocathodes and the large photovoltage of the presented system makes it ideal for pairing with photoanodes.

SUBMITTER: Rosser TE

PROVIDER: S-EPMC6348378 | biostudies-literature | 2018 Dec

REPOSITORIES: biostudies-literature

ACCESS DATA

Publications

La5 Ti2 Cu0.9 Ag0.1 S5 O7 Modified with a Molecular Ni Catalyst for Photoelectrochemical H2 Generation.

Rosser Timothy E TE Hisatomi Takashi T Sun Song S Antón-García Daniel D Minegishi Tsutomu T Reisner Erwin E Domen Kazunari K

Chemistry (Weinheim an der Bergstrasse, Germany) 20180606 69

The stable and efficient integration of molecular catalysts into p-type semiconductor materials is a contemporary challenge in photoelectrochemical fuel synthesis. Here, we report the combination of a phosphonated molecular Ni catalyst with a TiO2 -coated La5 Ti2 Cu0.9 Ag0.1 S5 O7 photocathode for visible light driven H2 production. This hybrid assembly provides a positive onset potential, large photocurrents ...[more]

PMID: 29752767

Similar Datasets

Project description:BackgroundBiofilm formation on medical device surfaces is a persistent problem that shelters bacteria and encourages infections and implant rejection. One promising approach to tackle this problem is to coat the medical device with an antimicrobial material. In this work, for the first time, we impart antimicrobial functionality to Ti3Au intermetallic alloy thin film coatings, while maintaining their superior mechanical hardness and biocompatibility.MethodsA mosaic Ti sputtering target is developed to dope controlled amounts of antimicrobial elements of Ag and Cu into a Ti3Au coating matrix by precise control of individual target power levels. The resulting Ti3Au-Ag/Cu thin film coatings are then systematically characterised for their structural, chemical, morphological, mechanical, corrosion, biocompatibility-cytotoxicity and antimicrobial properties.ResultsX-ray diffraction patterns reveal the formation of a super hard β-Ti3Au phase, but the thin films undergo a transition in crystal orientation from (200) to (211) with increasing Ag concentration, whereas introduction of Cu brings no observable changes in crystal orientation. Scanning and transmission electron microscopy analysis show the polyhedral shape of the Ti3Au crystal but agglomeration of Ag particles between crystal grains begins at 1.2 at% Ag and develops into large granules with increasing Ag concentration up to 4.1 at%. The smallest doping concentration of 0.2 at% Ag raises the hardness of the thin film to 14.7 GPa, a 360% improvement compared to the ∼4 GPa hardness of the standard Ti6Al4V base alloy. On the other hand, addition of Cu brings a 315-330% improvement in mechanical hardness of films throughout the entire concentration range of 0.5-7.1 at%. The thin films also show good electrochemical corrosion resistance and a > tenfold reduction in wear rate compared to Ti6Al4V alloy. All thin film samples exhibit very safe cytotoxic profiles towards L929 mouse fibroblast cells when analysed with Alamar blue assay, with ion leaching concentrations lower than 0.2 ppm for Ag and 0.08 ppm for Cu and conductivity tests reveal the positive effect of increased conductivity on myogenic differentiation. Antimicrobial tests show a drastic reduction in microbial survival over a short test period of < 20 min for Ti3Au films doped with Ag or Cu concentrations as low as 0.2-0.5 at%.ConclusionTherefore, according to these results, this work presents a new antimicrobial Ti3Au-Ag/Cu coating material with excellent mechanical performance with the potential to develop wear resistant medical implant devices with resistance to biofilm formation and bacterial infection.

Dataset Information

La₅ Ti₂ Cu_0.9 Ag_0.1 S₅ O₇ Modified with a Molecular Ni Catalyst for Photoelectrochemical H₂ Generation.

Publications

La<sub>5</sub> Ti<sub>2</sub> Cu<sub>0.9</sub> Ag<sub>0.1</sub> S<sub>5</sub> O<sub>7</sub> Modified with a Molecular Ni Catalyst for Photoelectrochemical H<sub>2</sub> Generation.

Similar Datasets

OmicsDI is part of the ELIXIR infrastructure

Tweets