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Effects of Dielectric Material, HMDS Layer, and Channel Length on the Performance of the Perylenediimide-Based Organic Field-Effect Transistors.

ABSTRACT: It is well-known that the improvement in the performance of organic field-effect transistors (OFETs) relies primarily on growth properties of organic molecules on gate dielectrics, their interface behavior, and on understanding the physical processes occurring during device operation. In this work, the relation of varying the dielectric materials in an n-type OFET device based on 1,7-dibromo-N,N'-dioctadecyl-3,4,9,10-perylenetetracarboxylic diimide (Br₂PTCDI-C18) molecule on a low-cost glass substrate at different channel lengths is reported, which is conceptually very important and fundamental in the context of device performance. Anodized alumina (Al₂O₃) along with dielectric films of polyvinyl alcohol (PVA) or polymethylmethacrylate (PMMA) was used to fabricate the devices and study their influence on various transistor properties. In addition, the effects of a thin hexamethyldisilazane (HMDS) layer on the performance of OFETs including their contact resistances were studied with the channel length variations. The devices with PVA dielectric material exhibited the maximum mobility values of 0.012-0.025 cm² V^-1 s^-1 irrespective of varying channel lengths from 25 to 190 ?m. The bias-stress measurements were recorded to realize the effects of the channel length and HMDS layer on the stability of the devices. The on/off ratios and electrical stabilities of these devices were enhanced significantly by modifying the surface of the PVA dielectric layer using a thin layer of HMDS. Similarly, in the case of PMMA dielectric layer, a drastic enhancement in the on/off ratio and bias-stress stability was observed. Characterization of all devices at different channel lengths using different dielectric materials permitted us to identify the effects of contact resistance on OFET devices. The stability of the devices in relation to the bias-stress measurements of devices by varying channel lengths and surface modification was systematically investigated. A careful analysis of oxide gate dielectrics modified with polymer-based dielectric materials, contact resistance, influence of thin HMDS layer on the electrical properties, and other parameters on top-contact bottom-gated configured n-type OFET devices is presented herein.

SUBMITTER: Vasimalla S

PROVIDER: S-EPMC6641061 | biostudies-literature | 2017 Jun

REPOSITORIES: biostudies-literature

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Effects of Dielectric Material, HMDS Layer, and Channel Length on the Performance of the Perylenediimide-Based Organic Field-Effect Transistors.

Vasimalla Suresh S Subbarao Nimmakayala V V NVV Gedda Murali M Goswami Dipak K DK Iyer Parameswar Krishnan PK

ACS omega 20170607 6

It is well-known that the improvement in the performance of organic field-effect transistors (OFETs) relies primarily on growth properties of organic molecules on gate dielectrics, their interface behavior, and on understanding the physical processes occurring during device operation. In this work, the relation of varying the dielectric materials in an n-type OFET device based on 1,7-dibromo-N,N'-dioctadecyl-3,4,9,10-perylenetetracarboxylic diimide (Br2PTCDI-C18) molecul ...[more]

PMID: 31457599

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Project description:The key impact and significance of a multilayer polymer-based dielectric system on the remarkable photoresponse properties of zinc phthalocyanine (ZnPc)-based photosensitive organic field-effect transistors (PS-OFETs) have been systematically analyzed at various incident optical powers. A combination of inorganic aluminum oxide (Al2O3) and organic nonpolar poly(methyl methacrylate) (PMMA) is used as the bilayer dielectric configuration, whereas in the trilayer dielectric system, a bilayer polymer dielectric, consisting of PMMA, as the low-k dielectric polymer, on top of poly(vinyl alcohol) (PVA), the high-k polar dielectric, has been fabricated along with Al2O3 as the third layer. Before fabricating the OFETs, a systematic optimization of the nature of growth of the ZnPc molecules, deposited on PMMA-coated glass substrates at different substrate temperatures (T s) was performed and examined by atomic-force microscopy, field-emission scanning electron microscopy, X-ray diffraction, and Raman analysis. At 90 °C, the fabricated PS-OFETs with the Al2O3/PVA/PMMA trilayer dielectric configuration showed the best p-channel behavior, with an enhanced and remarkable photoresponsivity of R ∼ 9689.39 A W-1 compared to that of the Al2O3/PMMA bilayer dielectric system (R ∼ 2679.40 A W-1) due to the polarization of the dipoles inside the polar PVA dielectric, which increases the charge transport through the channel. The charge carrier mobility of the device also improved by one order (μh ∼ 1.3 × 10-2 cm2 V-1 s-1) compared to that of the bilayer dielectric configuration (μh ∼ 3.5 × 10-3 cm2 V-1 s-1). The observed specific detectivity (D*) and NEP values of the bilayer dielectric system were 6.01 × 1013 Jones and 2.655 × 10-17 W Hz-1/2, whereas for the trilayer dielectric system, the observed D* and NEP values were 5.13 × 1014 Jones and 1.043 × 10-17 W Hz-1/2, respectively. Additionally, the operating voltage of each of the fabricated devices was also very low (-10 V) due to the influence of the inorganic high-k Al2O3 dielectric layer. The electrical stability of all of the fabricated devices was also investigated by bias stress analysis under both light and dark conditions in vacuum. To the best of our knowledge, the photoresponsivity (R) reported here with an Al2O3/PVA/PMMA trilayer dielectric configuration is the highest reported value for thin film-based PS-OFETs, at a remarkably low operating voltage of -10 V, on low-cost glass substrates without indium tin oxide or/and Si/SiO2.

Dataset Information

Effects of Dielectric Material, HMDS Layer, and Channel Length on the Performance of the Perylenediimide-Based Organic Field-Effect Transistors.

Publications

Effects of Dielectric Material, HMDS Layer, and Channel Length on the Performance of the Perylenediimide-Based Organic Field-Effect Transistors.

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