Nanoscale Au-ZnO Heterostructure Developed by Atomic Layer Deposition Towards Amperometric H2O2 Detection.

ABSTRACT: Nanoscale Au-ZnO heterostructures were fabricated on 4-in. SiO2/Si wafers by the atomic layer deposition (ALD) technique. Developed Au-ZnO heterostructures after post-deposition annealing at 250?°C were tested for amperometric hydrogen peroxide (H2O2) detection. The surface morphology and nanostructure of Au-ZnO heterostructures were examined by field emission scanning electron microscopy (FE-SEM), Raman spectroscopy, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), etc. Additionally, the electrochemical behavior of Au-ZnO heterostructures towards H2O2 sensing under various conditions is assessed by chronoamperometry and electrochemical impedance spectroscopy (EIS). The results showed that ALD-fabricated Au-ZnO heterostructures exhibited one of the highest sensitivities of 0.53??A??M-1?cm-2, the widest linear H2O2 detection range of 1.0??M-120?mM, a low limit of detection (LOD) of 0.78??M, excellent selectivity under the normal operation conditions, and great long-term stability. Utilization of the ALD deposition method opens up a unique opportunity for the improvement of the various capabilities of the devices based on Au-ZnO heterostructures for amperometric detection of different chemicals.

SUBMITTER: Xu H 

PROVIDER: S-EPMC7026348 | biostudies-literature | 2020 Feb

REPOSITORIES: biostudies-literature