Ontology highlight
ABSTRACT:
SUBMITTER: Rahman MM
PROVIDER: S-EPMC7153472 | biostudies-literature | 2020 Mar
REPOSITORIES: biostudies-literature
Nanomaterials (Basel, Switzerland) 20200315 3
This study represents a comparison of the border trap behavior and reliability between HfO<sub>2</sub> and ZrO<sub>2</sub> films on <i>n</i>-In<sub>0.53</sub>Ga<sub>0.47</sub>As with an Al<sub>2</sub>O<sub>3</sub> interfacial layer. The effect of different post metal annealing conditions on the trap response was analyzed and it was found that the N<sub>2</sub>:H<sub>2</sub> mixed FGA passivates the border trap quite well, whereas N<sub>2</sub>-based RTA performs better on interface traps. Al<sub ...[more]