Fine-Structure Analysis of Perhydropolysilazane-Derived Nano Layers in Deep-Buried Condition Using Polarized Neutron Reflectometry.

ABSTRACT: A large background scattering originating from the sample matrix is a major obstacle for fine-structure analysis of a nanometric layer buried in a bulk material. As polarization analysis can decrease undesired scattering in a neutron reflectivity (NR) profile, we performed NR experiments with polarization analysis on a polypropylene (PP)/perhydropolysilazane-derived SiO2 (PDS)/Si substrate sample, having a deep-buried layer of SiO2 to elucidate the fine structure of the nano-PDS layer. This method offers unique possibilities for increasing the amplitude of the Kiessig fringes in the higher scattering vector (Qz) region of the NR profiles in the sample by decreasing the undesired background scattering. Fitting and Fourier transform analysis results of the NR data indicated that the synthesi

SUBMITTER: Akutsu-Suyama K 

PROVIDER: S-EPMC7598669 | biostudies-literature | 2020 Sep

REPOSITORIES: biostudies-literature