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Production of an EP/PDMS/SA/AlZnO Coated Superhydrophobic Surface through an Aerosol-Assisted Chemical Vapor Deposition Process.

ABSTRACT: In this study, a superhydrophobic coating on glass has been prepared through a single-step aerosol-assisted chemical vapor deposition (AACVD) process. During the process, an aerosolized precursor containing polydimethylsiloxane, epoxy resin, and stearic acid functionalized Al-doped ZnO nanoparticles was deposited onto the glass at 350 °C. X-ray photoelectron spectroscopy, scanning electron microscopy, and atomic force microscopy showed that the precursor was successfully coated and formed a nano/microstructure (surface roughness: 378.0 ± 46.1 nm) on the glass surface. The coated surface had a water contact angle of 159.1 ± 1.2°, contact angle hysteresis of 2.2 ± 1.7°, and rolling off-angle of 1°, indicating that it was superhydrophobic. In the self-cleaning test of the coated surface at a tilted angle of 20°, it was shown that water droplets rolled and washed out dirt on the surface. The stability tests showed that the surface remained superhydrophobic after 120 h of exposure to ultraviolet (UV) irradiation and even after heat exposure at 350 °C. In addition, the surface was highly repellent to water solutions of pH 1-13. The results showed that the addition of the functionalized nanoparticles into the precursor allowed for the control of surface roughness and provided a simplified single-step fabrication process of the superhydrophobic surface. This provides valuable information for developing the manufacturing process for superhydrophobic surfaces.

SUBMITTER: Park S

PROVIDER: S-EPMC9245182 | biostudies-literature |

REPOSITORIES: biostudies-literature

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A Single-Step Route to Robust and Fluorine-Free Superhydrophobic Coatings via Aerosol-Assisted Chemical Vapor Deposition.

Project description:Robust fluorine-free superhydrophobic films were produced from a mixture of two fatty acids (stearic acid and palmitic acid), SiO2 nanoparticles, and polydimethylsiloxane. These simple and nontoxic compounds were deposited via aerosol-assisted chemical vapor deposition to provide the rough topography required for superhydrophobicity, formed through island growth of the aggregates. The optimum conditions for well-adhered superhydrophobic films produced films with a highly textured morphology, which possessed a water contact angle of 162 ± 2° and a sliding angle of <5°. Superhydrophobicity was maintained after ultraviolet exposure (14 days at 365 nm), heat treatment (5 h at 300 °C and 5 h at 400 °C), 300 tape peel cycles, and exposure to ethanol and toluene (5 h each).

| S-EPMC10249402 | biostudies-literature

Mathematical Modeling for the Design and Scale-Up of a Large Industrial Aerosol-Assisted Chemical Vapor Deposition Process under Uncertainty.

Project description:Aerosol-assisted chemical vapor deposition (AACVD) can be used to produce coatings and thin films such as transparent conducting oxide (TCO) films, which are used in self-cleaning surfaces, solar cells, and other electronic and optoelectronic applications. A process based on AACVD consists of a number of steps: aerosol generation, aerosol transport, aerosol delivery, and chemical deposition. Predicting the behavior of such a process at an industrial scale is challenging due to a number of factors: the aerosol generation creates droplets of different sizes, losses are incurred in the transport, the delivery must evaporate the solvent to release the precursors, and the reactions on the surface of the deposition target may be complex. This paper describes a full process model, including the prediction of the size distribution of the generated aerosol, the number and size of droplets delivered, the carrier gas temperature profile at the reaction site, the solvent evaporation time, and the rate of film formation. The key modeling challenges addressed include incorporating the impact of uncertainties in parameters such as heat and mass transfer coefficients and reaction rate constants. Preliminary simulations demonstrate a proof of concept for the use of simulation for gaining insights into the feasibility of a process scale-up for an industrial-scale AACVD.

| S-EPMC7147259 | biostudies-literature

Aerosol-assisted chemical vapour deposition of transparent superhydrophobic film by using mixed functional alkoxysilanes.

Project description:A method for the preparation of transparent superhydrophobic silica coatings on glass substrates via aerosol-assisted chemical vapour deposition (AACVD) is described. A multi-layer process to produce dual scale silica nanoparticles films, by using different functional alkoxysilanes was investigated. A first layer of 3-methacryloxypropyltrimethoxysilane (MPS) and a second layer of tetraethylorthosilicate (TEOS) were deposited at different temperatures to generate micro and nano particles of silica. Finally, a layer of perfluorooctyltriethoxysilane was deposited on top of the two layers to achieve superhydrophobicity. The transparent superhydrophobic film showed transparency of 90% in the visible light region with a static water contact angle of 165° and a sliding angle lower than 1°. Various durability tests were performed on the transparent superhydrophobic film, showing a constant water repellency after corrosion and organic solvents tests, strong resistance under UV light, and thermal stability up to 400 °C. Sandpaper mechanical robustness durability test showed superhydrophobicity for up to 5 rubbing cycles. In this study, a novel strategy to achieve highly transparent superhydrophobic glass surfaces using AACVD of alkoxysilanes, to produce surfaces with excellent durability is described. This shows great potential to obtain silica superhydrophobic films for large-scale applications.

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Impedance Spectroscopy Analysis of PbSe Nanostructures Deposited by Aerosol Assisted Chemical Vapor Deposition Approach.

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| S-EPMC8622599 | biostudies-literature

Impedance Spectroscopic Study of Nickel Sulfide Nanostructures Deposited by Aerosol Assisted Chemical Vapor Deposition Technique.

Project description:This research aims to synthesize the Bis(di-isobutyldithiophosphinato) nickel (II) complex [Ni(iBu2PS2)] to be employed as a substrate for the deposition of nickel sulfide nanostructures, and to investigate its dielectric and impedance characteristics for applications in the electronic industry. Various analytical tools including elemental analysis, mass spectrometry, IR, and TGA were also used to further confirm the successful synthesis of the precursor. NiS nanostructures were grown on the glass substrates by employing an aerosol assisted chemical vapor deposition (AACVD) technique via successful decomposition of the synthesized complex under variable temperature conditions. XRD, SEM, TEM, and EDX methods were well applied to examine resultant nanostructures. Dielectric studies of NiS were carried out at room temperature within the 100 Hz to 5 MHz frequency range. Maxwell-Wagner model gave a complete explanation of the variation of dielectric properties along with frequency. The reason behind high dielectric constant values at low frequency was further endorsed by Koops phenomenological model. The efficient translational hopping and futile reorientation vibration caused the overdue exceptional drift of ac conductivity (σac) along with the rise in frequency. Two relaxation processes caused by grains and grain boundaries were identified from the fitting of a complex impedance plot with an equivalent circuit model (Rg Cg) (Rgb Qgb Cgb). Asymmetry and depression in the semicircle having center present lower than the impedance real axis gave solid justification of dielectric behavior that is non-Debye in nature.

| S-EPMC8146325 | biostudies-literature

Transparent and conducting boron doped ZnO thin films grown by aerosol assisted chemical vapor deposition.

Project description:ZnO based transparent conducting oxides are important as they provide an alternative to the more expensive Sn : In2O3 that currently dominates the industry. Here, we investigate B-doped ZnO thin films grown via aerosol assisted chemical vapour deposition. B : ZnO films were produced from zinc acetate and triethylborane using either tetrahydrofuran or methanol (MeOH) as the solvent. The lowest resistivity of 5.1 × 10-3 Ω cm along with a visible light transmittance of ∼75-80% was achieved when using MeOH as the solvent. XRD analysis only detected the wurtzite phase of ZnO suggesting successful solid solution formation with B3+ substituting Zn2+ sites in the lattice. Refinement of the XRD patterns showed minimal distortion to the ZnO unit cell upon doping when MeOH was the solvent due to the immiscibility of the [BEt3] solution (1.0 M solution in hexane) in methanol that limited the amount of B going into the films, thus preventing excessive doping.

| S-EPMC9671099 | biostudies-literature

Tungsten Doped TiO2 with Enhanced Photocatalytic and Optoelectrical Properties via Aerosol Assisted Chemical Vapor Deposition.

Project description:Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalytic properties were produced via aerosol-assisted chemical vapor deposition of titanium ethoxide and dopant concentrations of tungsten ethoxide at 500?°C from a toluene solution. The films were anatase TiO2, with good n-type electrical conductivities as determined via Hall effect measurements. The film doped with 2.25 at.% W showed the lowest resistivity at 0.034??.cm and respectable charge carrier mobility (14.9?cm(3)/V.s) and concentration (×10(19)?cm(-3)). XPS indicated the presence of both W(6+) and W(4+) in the TiO2 matrix, with the substitutional doping of W(4+) inducing an expansion of the anatase unit cell as determined by XRD. The films also showed good photocatalytic activity under UV-light illumination, with degradation of resazurin redox dye at a higher rate than with undoped TiO2.

| S-EPMC4650706 | biostudies-other

An Aerosol-Assisted Chemical Vapor Deposition Route to Tin-Doped Gallium Oxide Thin Films with Optoelectronic Properties.

Project description:Gallium oxide is a wide-bandgap compound semiconductor material renowned for its diverse applications spanning gas sensors, liquid crystal displays, transparent electrodes, and ultraviolet detectors. This paper details the aerosol assisted chemical vapor deposition synthesis of tin doped gallium oxide thin films using gallium acetylacetonate and monobutyltin trichloride dissolved in methanol. It was observed that Sn doping resulted in a reduction in the transmittance of Ga2O3 films within the visible spectrum, while preserving the wide bandgap characteristics of 4.8 eV. Furthermore, Hall effect testing revealed a substantial decrease in the resistivity of Sn-doped Ga2O3 films, reducing it from 4.2 × 106 Ω cm to 2 × 105 Ω cm for the 2.5 at. % Sn:Ga2O3 compared to the nominally undoped Ga2O3.

| S-EPMC11360363 | biostudies-literature

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| S-EPMC5807387 | biostudies-literature

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol.

Project description:The development of methods to produce nanoscale features with tailored chemical functionalities is fundamental for applications such as nanoelectronics and sensor fabrication. The molecular-ruler process shows great utility for this purpose as it combines top-down lithography for the creation of complex architectures over large areas in conjunction with molecular self-assembly, which enables precise control over the physical and chemical properties of small local features. The molecular-ruler process, which most commonly uses mercaptoalkanoic acids and metal ions to generate metal-ligated multilayers, can be employed to produce registered nanogaps between metal features. Expansion of this methodology to include molecules with other chemical functionalities could greatly expand the overall versatility, and thus the utility, of this process. Herein, we explore the use of alkanethiol molecules as the terminating layer of metal-ligated multilayers. During this study, it was discovered that the solution deposition of alkanethiol molecules resulted in low overall surface coverage with features that varied in height. Because features with varied heights are not conducive to the production of uniform nanogaps via the molecular-ruler process, the vapor-phase deposition of alkanethiol molecules was explored. Unlike the solution-phase deposition, alkanethiol islands produced by vapor-phase deposition exhibited markedly higher surface coverages of uniform heights. To illustrate the applicability of this method, metal-ligated multilayers, both with and without an alkanethiol capping layer, were utilized to create nanogaps between Au features using the molecular-ruler process.

| S-EPMC5687049 | biostudies-literature

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