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Impedance Spectroscopy Analysis of PbSe Nanostructures Deposited by Aerosol Assisted Chemical Vapor Deposition Approach.

ABSTRACT: This research endeavor aimed to synthesize the lead (II) diphenyldiselenophosphinate complex and its use to obtain lead selenide nanostructured depositions and further the impedance spectroscopic analysis of these obtained PbSe nanostructures, to determine their roles in the electronics industry. The aerosol-assisted chemical vapor deposition technique was used to provide lead selenide deposition by decomposition of the complex at different temperatures using the glass substrates. The obtained films were revealed to be a pure cubic phase PbSe, as confirmed by X-ray diffraction analysis. SEM and TEM micrographs demonstrated three-dimensionally grown interlocked or aggregated nanocubes of the obtained PbSe. Characteristic dielectric measurements and the impedance spectroscopy analysis at room temperature were executed to evaluate PbSe properties over the frequency range of 100 Hz-5 MHz. The dielectric constant and dielectric loss gave similar trends, along with altering frequency, which was well explained by the Koops theory and Maxwell-Wagner theory. The effective short-range translational carrier hopping gave rise to an overdue remarkable increase in ac conductivity (σ_ac) on the frequency increase. Fitting of a complex impedance plot was carried out with an equivalent circuit model (R_g C_g) (R_gb Q_gb C_gb), which proved that grains, as well as grain boundaries, are responsible for the relaxation processes. The asymmetric depressed semicircle with the center lower to the impedance real axis provided a clear explanation of non-Debye dielectric behavior.

SUBMITTER: Iram S

PROVIDER: S-EPMC8622599 | biostudies-literature |

REPOSITORIES: biostudies-literature

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Impedance Spectroscopic Study of Nickel Sulfide Nanostructures Deposited by Aerosol Assisted Chemical Vapor Deposition Technique.

Project description:This research aims to synthesize the Bis(di-isobutyldithiophosphinato) nickel (II) complex [Ni(iBu2PS2)] to be employed as a substrate for the deposition of nickel sulfide nanostructures, and to investigate its dielectric and impedance characteristics for applications in the electronic industry. Various analytical tools including elemental analysis, mass spectrometry, IR, and TGA were also used to further confirm the successful synthesis of the precursor. NiS nanostructures were grown on the glass substrates by employing an aerosol assisted chemical vapor deposition (AACVD) technique via successful decomposition of the synthesized complex under variable temperature conditions. XRD, SEM, TEM, and EDX methods were well applied to examine resultant nanostructures. Dielectric studies of NiS were carried out at room temperature within the 100 Hz to 5 MHz frequency range. Maxwell-Wagner model gave a complete explanation of the variation of dielectric properties along with frequency. The reason behind high dielectric constant values at low frequency was further endorsed by Koops phenomenological model. The efficient translational hopping and futile reorientation vibration caused the overdue exceptional drift of ac conductivity (σac) along with the rise in frequency. Two relaxation processes caused by grains and grain boundaries were identified from the fitting of a complex impedance plot with an equivalent circuit model (Rg Cg) (Rgb Qgb Cgb). Asymmetry and depression in the semicircle having center present lower than the impedance real axis gave solid justification of dielectric behavior that is non-Debye in nature.

| S-EPMC8146325 | biostudies-literature

Study of deposition parameters and growth kinetics of ZnO deposited by aerosol assisted chemical vapor deposition.

Project description:Aerosol-assisted Chemical Vapor Deposition (AACVD) is a thermally activated CVD technique that uses micro-droplets as deposition precursors. An AACVD system with a custom-designed reaction chamber has been implemented to grow ZnO thin films using zinc chloride as a precursor. The present work aims to study the impact of the deposition parameters on the thin film, as well as the microstructure evolution and growth kinetics. Aerosol flow has an effect on the density of nucleation sites and on the grain size. The temperature affects the morphology of the grown ZnO, showing a preferential orientation along the c-axis for 350 °C, 375 °C and 400 °C substrate temperatures. The microstructural evolution and the growth kinetics are also presented. A different evolution behavior has been observed for 350 °C, where nucleation site density is the highest at the early stages and it decreases over time in contrast with the cases of 375 °C and 400 °C, where there is an initial increase and a subsequent decrease. The activation energy of the chemical reaction is 1.06 eV. The optical characterization of the material has been performed through reflection measurements showing a relationship between the spectrum and the ZnO film thickness. The electrical characterization has been done by means of an interdigital capacitor, with which it is possible to measure the grain and grain boundary resistance of the material. Both resistances are of the order of 105-106 Ω.

| S-EPMC9033435 | biostudies-literature

Plasma-Assisted Chemical Vapor Deposition of F-Doped MnO2 Nanostructures on Single Crystal Substrates.

Project description:MnO2 nanostructures were fabricated by plasma assisted-chemical vapor deposition (PA-CVD) using a fluorinated diketonate diamine manganese complex, acting as single-source precursor for both Mn and F. The syntheses were performed from Ar/O2 plasmas on MgAl2O4(100), YAlO3(010), and Y3Al5O12(100) single crystals at a growth temperature of 300 °C, in order to investigate the substrate influence on material chemico-physical properties. A detailed characterization through complementary analytical techniques highlighted the formation of highly pure and oriented F-doped systems, comprising the sole β-MnO2 polymorph and exhibiting an inherent oxygen deficiency. Optical absorption spectroscopy revealed the presence of an appreciable Vis-light harvesting, of interest in view of possible photocatalytic applications in pollutant degradation and hydrogen production. The used substrates directly affected the system structural features, as well as the resulting magnetic characteristics. In particular, magnetic force microscopy (MFM) measurements, sensitive to the out-of-plane magnetization component, highlighted the formation of spin domains and long-range magnetic ordering in the developed materials, with features dependent on the system morphology. These results open the door to future engineering of the present nanostructures as possible magnetic media for integration in data storage devices.

| S-EPMC7407531 | biostudies-literature

Thin films of formamidinium lead iodide (FAPI) deposited using aerosol assisted chemical vapour deposition (AACVD).

Project description:Formamidinium lead iodide (CH(NH2)2PbI3, FAPI) thin films have been deposited on glass substrates at 150 °C using ambient pressure aerosol assisted chemical vapour deposition (AACVD). The films have been analysed by a range of techniques including powder X-ray diffraction (pXRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, and UV-Vis-NIR absorption spectroscopy. Sharp reflections in the pXRD pattern can be indexed to the α-phase of FAPI which confirms the crystallinity of the as-deposited film and reveals a preferred growth orientation along the (002) plane with respect to the substrate. High magnification SEM images show that the thin film is comprised of a network of intimately connected FAPI crystallites which form a mesoporous architecture. EDX mapping of lead and iodine emission peaks show that the Pb and I within these films are spatially co-localised. Optical measurements show as-deposited FAPI films have absorption onsets in the near infra-red with a direct bandgap value of 1.46 eV, suitable for single junction solar cells. Four-point probe measurement of as deposited films show that the electrical conductivity (σ) of the FAPI thin film is 5.2 × 10-7 S/cm, which is similar to FAPI thin films deposited by spin coating technique.

| S-EPMC7747716 | biostudies-literature

Metal/Carbon Hybrid Nanostructures Produced from Plasma-Enhanced Chemical Vapor Deposition over Nafion-Supported Electrochemically Deposited Cobalt Nanoparticles.

Project description:In this work, we report development of hybrid nanostructures of metal nanoparticles (NP) and carbon nanostructures with strong potential for catalysis, sensing, and energy applications. First, the etched silicon wafer substrates were passivated for subsequent electrochemical (EC) processing through grafting of nitro phenyl groups using para-nitrobenzene diazonium (PNBT). The X-ray photoelectron spectroscope (XPS) and atomic force microscope (AFM) studies confirmed presence of few layers. Cobalt-based nanoparticles were produced over dip or spin coated Nafion films under different EC reduction conditions, namely CoSO₄ salt concentration (0.1 M, 1 mM), reduction time (5, 20 s), and indirect or direct EC reduction route. Extensive AFM examination revealed NP formation with different attributes (size, distribution) depending on electrochemistry conditions. While relatively large NP with >100 nm size and bimodal distribution were obtained after 20 s EC reduction in H₃BO₃ following Co2+ ion uptake, ultrafine NP (<10 nm) could be produced from EC reduction in CoSO₄ and H₃BO₃ mixed solution with some tendency to form oxides. Different carbon nanostructures including few-walled or multiwalled carbon nanotubes (CNT) and carbon nanosheets were grown in a C₂H₂/NH₃ plasma using the plasma-enhanced chemical vapor deposition technique. The devised processing routes enable size controlled synthesis of cobalt nanoparticles and metal/carbon hybrid nanostructures with unique microstructural features.

| S-EPMC5978064 | biostudies-literature

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| S-EPMC9671099 | biostudies-literature

Tungsten Doped TiO2 with Enhanced Photocatalytic and Optoelectrical Properties via Aerosol Assisted Chemical Vapor Deposition.

Project description:Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalytic properties were produced via aerosol-assisted chemical vapor deposition of titanium ethoxide and dopant concentrations of tungsten ethoxide at 500?°C from a toluene solution. The films were anatase TiO2, with good n-type electrical conductivities as determined via Hall effect measurements. The film doped with 2.25 at.% W showed the lowest resistivity at 0.034??.cm and respectable charge carrier mobility (14.9?cm(3)/V.s) and concentration (×10(19)?cm(-3)). XPS indicated the presence of both W(6+) and W(4+) in the TiO2 matrix, with the substitutional doping of W(4+) inducing an expansion of the anatase unit cell as determined by XRD. The films also showed good photocatalytic activity under UV-light illumination, with degradation of resazurin redox dye at a higher rate than with undoped TiO2.

| S-EPMC4650706 | biostudies-other

An Aerosol-Assisted Chemical Vapor Deposition Route to Tin-Doped Gallium Oxide Thin Films with Optoelectronic Properties.

Project description:Gallium oxide is a wide-bandgap compound semiconductor material renowned for its diverse applications spanning gas sensors, liquid crystal displays, transparent electrodes, and ultraviolet detectors. This paper details the aerosol assisted chemical vapor deposition synthesis of tin doped gallium oxide thin films using gallium acetylacetonate and monobutyltin trichloride dissolved in methanol. It was observed that Sn doping resulted in a reduction in the transmittance of Ga2O3 films within the visible spectrum, while preserving the wide bandgap characteristics of 4.8 eV. Furthermore, Hall effect testing revealed a substantial decrease in the resistivity of Sn-doped Ga2O3 films, reducing it from 4.2 × 106 Ω cm to 2 × 105 Ω cm for the 2.5 at. % Sn:Ga2O3 compared to the nominally undoped Ga2O3.

| S-EPMC11360363 | biostudies-literature

A Single-Step Route to Robust and Fluorine-Free Superhydrophobic Coatings via Aerosol-Assisted Chemical Vapor Deposition.

Project description:Robust fluorine-free superhydrophobic films were produced from a mixture of two fatty acids (stearic acid and palmitic acid), SiO2 nanoparticles, and polydimethylsiloxane. These simple and nontoxic compounds were deposited via aerosol-assisted chemical vapor deposition to provide the rough topography required for superhydrophobicity, formed through island growth of the aggregates. The optimum conditions for well-adhered superhydrophobic films produced films with a highly textured morphology, which possessed a water contact angle of 162 ± 2° and a sliding angle of <5°. Superhydrophobicity was maintained after ultraviolet exposure (14 days at 365 nm), heat treatment (5 h at 300 °C and 5 h at 400 °C), 300 tape peel cycles, and exposure to ethanol and toluene (5 h each).

| S-EPMC10249402 | biostudies-literature

Production of an EP/PDMS/SA/AlZnO Coated Superhydrophobic Surface through an Aerosol-Assisted Chemical Vapor Deposition Process.

Project description:In this study, a superhydrophobic coating on glass has been prepared through a single-step aerosol-assisted chemical vapor deposition (AACVD) process. During the process, an aerosolized precursor containing polydimethylsiloxane, epoxy resin, and stearic acid functionalized Al-doped ZnO nanoparticles was deposited onto the glass at 350 °C. X-ray photoelectron spectroscopy, scanning electron microscopy, and atomic force microscopy showed that the precursor was successfully coated and formed a nano/microstructure (surface roughness: 378.0 ± 46.1 nm) on the glass surface. The coated surface had a water contact angle of 159.1 ± 1.2°, contact angle hysteresis of 2.2 ± 1.7°, and rolling off-angle of 1°, indicating that it was superhydrophobic. In the self-cleaning test of the coated surface at a tilted angle of 20°, it was shown that water droplets rolled and washed out dirt on the surface. The stability tests showed that the surface remained superhydrophobic after 120 h of exposure to ultraviolet (UV) irradiation and even after heat exposure at 350 °C. In addition, the surface was highly repellent to water solutions of pH 1-13. The results showed that the addition of the functionalized nanoparticles into the precursor allowed for the control of surface roughness and provided a simplified single-step fabrication process of the superhydrophobic surface. This provides valuable information for developing the manufacturing process for superhydrophobic surfaces.

| S-EPMC9245182 | biostudies-literature

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