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E-beam lithography for micro-nanofabrication.


ABSTRACT: Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.

SUBMITTER: Altissimo M 

PROVIDER: S-EPMC2917861 | biostudies-other | 2010

REPOSITORIES: biostudies-other

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