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Molybdenum(IV) dithiocarboxylates as single-source precursors for AACVD of MoS2 thin films.


ABSTRACT: Tetrakis(dithiocarboxylato)molybdenum(IV) complexes of the type Mo(S2CR)4 (R = Me, Et, iPr, Ph) were synthesized, characterized, and prescreened as precursors for aerosol assisted chemical vapor deposition (AACVD) of MoS2 thin films. The thermal behavior of the complexes as determined by TGA and GC-MS was appropriate for AACVD, although the complexes were not sufficiently volatile for conventional CVD bubbler systems. Thin films of MoS2 were grown by AACVD at 500 °C from solutions of Mo(S2CMe)4 in toluene. The films were characterized by GIXRD diffraction patterns which correspond to a 2H-MoS2 structure in the deposited film. Mo-S bonding in 2H-MoS2 was further confirmed by XPS and EDS. The film morphology, vertically oriented structure, and thickness (2.54 μm) were evaluated by FE-SEM. The Raman E12g and A1g vibrational modes of crystalline 2H-MoS2 were observed. These results demonstrate the use of dithiocarboxylato ligands for the chemical vapor deposition of metal sulfides.

SUBMITTER: Muhammad S 

PROVIDER: S-EPMC9426634 | biostudies-literature | 2022 Aug

REPOSITORIES: biostudies-literature

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Molybdenum(IV) dithiocarboxylates as single-source precursors for AACVD of MoS<sub>2</sub> thin films.

Muhammad Saleh S   Ferenczy Erik T ET   Germaine Ian M IM   Wagner J Tyler JT   Jan Muhammad T MT   McElwee-White Lisa L  

Dalton transactions (Cambridge, England : 2003) 20220823 33


Tetrakis(dithiocarboxylato)molybdenum(IV) complexes of the type Mo(S<sub>2</sub>CR)<sub>4</sub> (R = Me, Et, <sup><i>i</i></sup>Pr, Ph) were synthesized, characterized, and prescreened as precursors for aerosol assisted chemical vapor deposition (AACVD) of MoS<sub>2</sub> thin films. The thermal behavior of the complexes as determined by TGA and GC-MS was appropriate for AACVD, although the complexes were not sufficiently volatile for conventional CVD bubbler systems. Thin films of MoS<sub>2</su  ...[more]

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