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Real-time identification of the evolution of conducting nano-filaments in TiO2 thin film ReRAM.


ABSTRACT: Unipolar resistance switching (RS) in TiO2 thin films originates from the repeated formation and rupture of the Magnéli phase conducting filaments through repeated nano-scale phase transitions. By applying the Johnson-Mehl-Avrami (JMA) type kinetic model to the careful analysis on the evolution of transient current in a pulse-switching, it was possible to elucidate the material specific evolution of the Magnéli phase filament. This methodology was applied to the two types of TiO2 films grown by plasma-enhanced atomic layer deposition (PEALD) and sputtering. These two samples have structurally and electrically distinctive properties: PEALD film exhibited high variability in switching parameters and required an electroforming while sputtered film showed higher uniformity without distinct electroforming process. The JMA-type kinetic analysis of the RS behaviors revealed that the rejuvenation of the filament is accomplished by repeated one-dimensional nucleation followed by a two-dimensional growth in PEALD samples, whereas one-dimensional nucleation-free mechanism dominates in sputtered films.

SUBMITTER: Song SJ 

PROVIDER: S-EPMC3853657 | biostudies-literature | 2013 Dec

REPOSITORIES: biostudies-literature

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Real-time identification of the evolution of conducting nano-filaments in TiO2 thin film ReRAM.

Song Seul Ji SJ   Seok Jun Yeong JY   Yoon Jung Ho JH   Kim Kyung Min KM   Kim Gun Hwan GH   Lee Min Hwan MH   Hwang Cheol Seong CS  

Scientific reports 20131206


Unipolar resistance switching (RS) in TiO2 thin films originates from the repeated formation and rupture of the Magnéli phase conducting filaments through repeated nano-scale phase transitions. By applying the Johnson-Mehl-Avrami (JMA) type kinetic model to the careful analysis on the evolution of transient current in a pulse-switching, it was possible to elucidate the material specific evolution of the Magnéli phase filament. This methodology was applied to the two types of TiO2 films grown by  ...[more]

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